[G-1-3] Key mechanisms for improved EM lifetime of CoWP capped Cu interconnects

Yumi Kakuhara, Naoyoshi Kawahara, Kazuyoshi Ueno, Noriaki Oda (1.NEC Electronics Corporation, Advanced Device Development Division, 2.Shibaura Institute of Technology, Dept. of Electronic Engineering)

https://doi.org/10.7567/SSDM.2006.G-1-3