[G-9-1] Reliability challenges for advanced copper low-k interconnects

Zs. Tokei、C. Bruynseraede、Y-L. Li、I. Ciofi、G. P. Beyer (1.IMEC、2.Dept. of Electrical Engineering, Katholieke Universiteit Leuven)

https://doi.org/10.7567/SSDM.2006.G-9-1