[G-9-1] Reliability challenges for advanced copper low-k interconnects

Zs. Tokei, C. Bruynseraede, Y-L. Li, I. Ciofi, G. P. Beyer (1.IMEC, 2.Dept. of Electrical Engineering, Katholieke Universiteit Leuven)

https://doi.org/10.7567/SSDM.2006.G-9-1