[H-1-4] Sub-30 nm Strained P-Channel FinFETs with Condensed SiGe Source/Drain Stressors

Kian-Ming Tan、Tsung-Yang Liow、Rinus T. P. Lee、King-Jien Chui、Chih-Hang Tung、N. Balasubramanian、Ganesh S. Samudra、Won-Jong Yoo、Yee-Chia Yeo (1.Silicon Nano Device Lab., Dept of Electrical and Computer Engineering, National University of Singapore、2.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2006.H-1-4