[H-2-1] Potential of and Issues with Multiple-Stressor Technology (MST) in High-Performance 45nm Generation Devices

T. Miyashita、A. Hatada、Y. Shimamune、T. Owada、N. Tamura、T. Aoyama、S. Satoh (1.Fujitsu Laboratories Ltd.、2.Fujitsu Limited.)

https://doi.org/10.7567/SSDM.2006.H-2-1