[H-8-2] Ultra-thin Ge-on-Insulator (GOI) Metal S/D p-channel MOSFETs fabricated by low temperature MBE growth

Takashi Uehara, Hiroshi Matsubara, Satoshi Sugahara, Shinichi Takagi (1.Graduate School of Frontier Science, The Univ. of Tokyo)

https://doi.org/10.7567/SSDM.2006.H-8-2