[J-1-2] Demonstration of Low Vt NMOSFETs Using Thin HfLaO in ALD TiN/HfSiO Gate Stack

C. S. Park、S. C. Song、G. Bersuker、H.N. Alshareef、B. S. Ju、P. Majhi、B.H. Lee、R. Jammy、H. K. Park、M. S. Joo、J. Pu、B. J. Cho (1.SEMATECH、2.Texas Instruments、3.Intel、4.IBM Assignees、5.GIST, Korea, and、6.SNDL, NUS, Singapore)

https://doi.org/10.7567/SSDM.2006.J-1-2