[J-1-2] Demonstration of Low Vt NMOSFETs Using Thin HfLaO in ALD TiN/HfSiO Gate Stack

C. S. Park, S. C. Song, G. Bersuker, H.N. Alshareef, B. S. Ju, P. Majhi, B.H. Lee, R. Jammy, H. K. Park, M. S. Joo, J. Pu, B. J. Cho (1.SEMATECH, 2.Texas Instruments, 3.Intel, 4.IBM Assignees, 5.GIST, Korea, and, 6.SNDL, NUS, Singapore)

https://doi.org/10.7567/SSDM.2006.J-1-2