[J-1-4] Study of La Concentration Dependent VFB Shift in Metal/HfLaOx/Si Capacitors

Yoshiki Yamamoto、Koji Kita、Kentaro Kyuno、Akira Toriumi (1.Department of Materials Engineering, School of Engineering, The University of Tokyo)

https://doi.org/10.7567/SSDM.2006.J-1-4