[J-10-4] Thermal stability of metal electrodes and its impact on gate dielectric characteristics

H. Park、H. C. Wen、M. Chang、M. Jo、R. Choi、B. H. Lee、S.C. Song、C. Y. Kang、T. Lee、G. Brown、J. C. Lee、H. Hwang (1.Department of Materials Science and Engineering, Gwangju Institute of Science and Technology、2.SEMATECH、3.IBM Assignee、4.Microelectronics Research Center, The University of Texas at Austin)

https://doi.org/10.7567/SSDM.2006.J-10-4