[J-2-2] Pd2Si Fully-Silicided Gate: Kinetics of Silicide Formation and Workfunction Tuning

Takuji Hosoi, Kosuke Sano, Kosei Hosawa, Kentaro Shibahara (1.Research Center for Nanodevices and Systems, Hiroshima University)

https://doi.org/10.7567/SSDM.2006.J-2-2