[J-2-3] Workfunction Adjustment Using Thin Metal Film (Ti, Pd) under FUSI Gate Electrode and Laser Annealing

Y. Huang、K. L. Pey、D. Z. Chi、K. K. Ong、P. S. Lee、I. S. Goh (1.Microelectronics Center, School of Electrical and Electronic Engineering, Nanyang Technological University、2.Systems on Silicon Manufacturing Co. Pte. Ltd., Singapore、3.Institute of Material Research & Engineering, Singapore、4.School of Material Science and Engineering, Nanyang Technological University, Singapore)

https://doi.org/10.7567/SSDM.2006.J-2-3