[J-3-3] Nonlinear Al Concentration Dependence of the HfAlOx/Si Conduction Band Offset Studied by Internal Photoemission Spectroscopy

T. Horikawa、A. Ogawa、K. Iwamoto、K. Okada、H. Ota、T. Nabatame、A. Toriumi (1.MIRAI-ASRC, AIST、2.MIRAI-ASET、3.Univ. of Tokyo)

https://doi.org/10.7567/SSDM.2006.J-3-3