[J-3-3] Nonlinear Al Concentration Dependence of the HfAlOx/Si Conduction Band Offset Studied by Internal Photoemission Spectroscopy

T. Horikawa, A. Ogawa, K. Iwamoto, K. Okada, H. Ota, T. Nabatame, A. Toriumi (1.MIRAI-ASRC, AIST, 2.MIRAI-ASET, 3.Univ. of Tokyo)

https://doi.org/10.7567/SSDM.2006.J-3-3