[J-8-2] Sub-30 nm P-channel Schottky Source/Drain FinFETs: Integration of Pt3Si FUSI Metal Gate and High-κ Dielectric

Rinus T. P. Lee、Kian-Ming Tan、Andy Eu-Jin Lim、Tsung-Yang Liow、Guo-Qiang Lo、Ganesh Samudra、Dong Zhi Chi、Yee-Chia Yeo (1.Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapore、2.Institute of Materials Research and Engineering、3.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2006.J-8-2