[J-9-1] Degradation and Breakdown of Sub-1nm EOT HfO2/Metal Gate Stacks

G. Groeseneken、R. Degraeve、T. Kauerauf、M. Cho、M. Zahid、L-A. Ragnarsson、D. P. Brunco、B. Kaczer、Ph. Roussel、S De Gendt (1.IMEC、2.KU Leuven、3.Seoul National University、4.John Moores University、5.Intel assignee at IMEC)

https://doi.org/10.7567/SSDM.2006.J-9-1