[J-9-3] Reliability of thick oxides integrated with HfSiOx gate dielectric

B. H. Lee, C. Y. Kang, T. H. Lee, J. Barnett, R. Choi, S. C. Song, R. Jammy (1.SEMATECH, 2.IBM assignee, 3.University of Texas at Austin)

https://doi.org/10.7567/SSDM.2006.J-9-3