[P-1-6] Epitaxial High-K Oxide Metal Gate MOSFETs: Damascene CMP Process Integration and Electrical Results

Ralf Endres、Yordan Stefanov、Udo Schwalke (1.Institute for Semiconductor Technology and Nanoelectronics, Darmstadt University of Technology)

https://doi.org/10.7567/SSDM.2006.P-1-6