The Japan Society of Applied Physics

[P-2-9] Ag diffusion in Low-K material (SiOC and BCN) and its challenges using as an interconnection

M. K. Mazumder, R. Moriyama, C. Kimura, H. Aoki, T. Sugino (1.Dept. of Electrical, Electronic and Information Engineering, Osaka University)

https://doi.org/10.7567/SSDM.2006.P-2-9