The Japan Society of Applied Physics

[P-3-1] An Efficient Mobility Enhancement Engineering on 65nm FUSI CMOSFETs using a Second CESL Process

Chieh-Ming Lai, Yean-Kuen Fang, Chien-Ting Lin, Wen-Kuan Yeh, Chia-Wei Hsu, Che-Hua Hsu, Liang-Wei Chen, Mike Ma (1.Institute of Microelectronics, National Cheng Kung University, 2.Department of Electrical Engineering, National University of Kaohsiung, 3.United Microelectronics Corporation, Central R&D Division)

https://doi.org/10.7567/SSDM.2006.P-3-1