[P-3-15] Impacts of LP-SiN Capping Layer and Lateral Diffusion of interface Trap on Hot Carrier Stress of NMOSFETs

Chia-Yu Lua、Ching-Sen Lua、Yu-Lin Hsieha、Yao-Jen Leeb、Horng-Chih Lin、Tiao-Yuan Huanga (1.National Chiao Tung University、2.National Nano Device Laboratories)

https://doi.org/10.7567/SSDM.2006.P-3-15