[P-3-15] Impacts of LP-SiN Capping Layer and Lateral Diffusion of interface Trap on Hot Carrier Stress of NMOSFETs

Chia-Yu Lua, Ching-Sen Lua, Yu-Lin Hsieha, Yao-Jen Leeb, Horng-Chih Lin, Tiao-Yuan Huanga (1.National Chiao Tung University, 2.National Nano Device Laboratories)

https://doi.org/10.7567/SSDM.2006.P-3-15