Thermally Robust Germanium MIS Gate Stacks with LaYO3 Dielectric Film

Toshitake Takahashi; Yi Zhao; Tomonori Nishimura; Koji Kita; Akira Toriumi

doi:https://doi.org/10.7567/SSDM.2007.A-2-5

2007 International Conference on Solid State Devices and Materials

2007年9月18日〜 2007年9月21日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[A-2-5] Thermally Robust Germanium MIS Gate Stacks with LaYO3 Dielectric Film

Toshitake Takahashi、Yi Zhao、Tomonori Nishimura、Koji Kita、Akira Toriumi (1.Department of Materials Engineering, School of Engineering, The University of Tokyo)

https://doi.org/10.7567/SSDM.2007.A-2-5

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