Thermally Robust Germanium MIS Gate Stacks with LaYO3 Dielectric Film

Toshitake Takahashi; Yi Zhao; Tomonori Nishimura; Koji Kita; Akira Toriumi

doi:https://doi.org/10.7567/SSDM.2007.A-2-5

2007 International Conference on Solid State Devices and Materials

Sep 18, 2007 - Sep 21, 2007
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[A-2-5] Thermally Robust Germanium MIS Gate Stacks with LaYO3 Dielectric Film

Toshitake Takahashi, Yi Zhao, Tomonori Nishimura, Koji Kita, Akira Toriumi (1.Department of Materials Engineering, School of Engineering, The University of Tokyo)

https://doi.org/10.7567/SSDM.2007.A-2-5

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