[A-5-3] Si1-xGex/Si Selective Etch with HCl for Thin Si-Channel Transistors Integration

N. Loubet、S. Denorme、A. Pouydebasque、F. Leverd、P. Gouraud、C. Tallaron、T. Skotnicki、D. Dutartre (1.STMicroelectronics、2.NXP Semiconductors)

https://doi.org/10.7567/SSDM.2007.A-5-3