The Japan Society of Applied Physics

[A-5-3] Si1-xGex/Si Selective Etch with HCl for Thin Si-Channel Transistors Integration

N. Loubet, S. Denorme, A. Pouydebasque, F. Leverd, P. Gouraud, C. Tallaron, T. Skotnicki, D. Dutartre (1.STMicroelectronics, 2.NXP Semiconductors)

https://doi.org/10.7567/SSDM.2007.A-5-3