[A-6-1] Effects of O2 Plasma Treatment on the Reliabilities of Metal Gate/High-k Dielectric MOSFETs

Kyong Taek Lee, Chang Yong Kang, Rino Choi, Seung Chul Song, Byoung Hun Lee, Hi-Deok Lee, Yoon-Ha Jeong (1.Dept. of Electronic and Electrical Engineering, Pohang University of Science and Technology (POSTECH), 2.SEMATECH, 3.IBM assignee, 4.Dept. of Electronics Engineering, Chungnam National Univ, Korea, 5.University of Texas at Austin)

https://doi.org/10.7567/SSDM.2007.A-6-1