[A-6-1] Effects of O2 Plasma Treatment on the Reliabilities of Metal Gate/High-k Dielectric MOSFETs

Kyong Taek Lee、Chang Yong Kang、Rino Choi、Seung Chul Song、Byoung Hun Lee、Hi-Deok Lee、Yoon-Ha Jeong (1.Dept. of Electronic and Electrical Engineering, Pohang University of Science and Technology (POSTECH)、2.SEMATECH、3.IBM assignee、4.Dept. of Electronics Engineering, Chungnam National Univ, Korea、5.University of Texas at Austin)

https://doi.org/10.7567/SSDM.2007.A-6-1