[A-6-3] A Comparative Study of Plasma Source-Dependent Charging Polarity in MOSFETs with High-k and SiO2 Gate Dielectrics

Koji Eriguchi、Masayuki Kamei、Daisuke Hamada、Kenji Okada、Kouichi Ono (1.Graduate School of Engineering, Kyoto University、2.MIRAI-AIST)

https://doi.org/10.7567/SSDM.2007.A-6-3