[A-6-4] Suppression of Gate-Edge Metamorphoses of Metal/High-k Gate Stack by Low-Temperature, Cl-Free SiN Offset Spacer and its Impact on Scaled MOSFETs

N. Mise、T. Matsuki、T. Watanabe、T. Robata、T. Morooka、T. Eimori、Y. Nara (1.Semiconductor Leading Edge Technologies, Inc.)

https://doi.org/10.7567/SSDM.2007.A-6-4