[A-7-2] Anomalous positive Vfb shift in HfAlOx MOS gate stacks

Wenwu Wang、Koji Akiyama、Wataru Mizubayashi、Minoru Ikeda、Hiroyuki Ota、Toshihide Nabatame、Akira Toriumi (1.MIRAI-ASRC、2.MIRAI-ASET、3.The University of Tokyo)

https://doi.org/10.7567/SSDM.2007.A-7-2