Anomalous positive Vfb shift in HfAlOx MOS gate stacks

Wenwu Wang; Koji Akiyama; Wataru Mizubayashi; Minoru Ikeda; Hiroyuki Ota; Toshihide Nabatame; Akira Toriumi

doi:https://doi.org/10.7567/SSDM.2007.A-7-2

2007 International Conference on Solid State Devices and Materials

Sep 18, 2007 - Sep 21, 2007
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[A-7-2] Anomalous positive Vfb shift in HfAlOx MOS gate stacks

Wenwu Wang, Koji Akiyama, Wataru Mizubayashi, Minoru Ikeda, Hiroyuki Ota, Toshihide Nabatame, Akira Toriumi (1.MIRAI-ASRC, 2.MIRAI-ASET, 3.The University of Tokyo)

https://doi.org/10.7567/SSDM.2007.A-7-2

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