[A-7-4] Systematic studies on Fermi level pining of Hf-based high-k gate stacks

K. Shiraishi、Y. Akasaka、G. Nakamura、M. Kadoshima、H. Watanabe、K. Ohmori、T. Chikyow、K. Yamabe、Y. Nara、Y. Ohji、K. Yamada (1.Graduate School of Pure and Applied Sciences, Univ. of Tsukuba、2.CREST, Japan Science and Technology Agency、3.Semiconductor Leading Edge Technology Inc.、4.Graduate School of Engineering, Osaka University、5.Nanotechnology Research Laboratories, Waseda University、6.National Institute of Materials Science、7.Present address: Tokyo Electron Inc.)

https://doi.org/10.7567/SSDM.2007.A-7-4