[A-8-3] Highly Manufacturable CMOSFETs with Single High-k (HfLaO) and Dual Metal Gate Integration Process

X.P. Wang, M.-F. Li, H.Y. Yu, J.J. Yang, C.X. Zhu, W.S. Hwang, W.Y. Loh, A.Y. Du, J.D. Chen, Albert Chin, S. Biesemans, G.Q. Lo, D.-L. Kwong (1.SNDL, ECE Dept, National University of Singapore, 2.Institute of Microelectronics, Singapore, 3.IMEC, 4.Dept. of Microelectronics, Fudan University, 5.Dept. of Electronics Eng., Nat’l Chiao-Tung Univ.)

https://doi.org/10.7567/SSDM.2007.A-8-3