[A-8-3] Highly Manufacturable CMOSFETs with Single High-k (HfLaO) and Dual Metal Gate Integration Process

X.P. Wang、M.-F. Li、H.Y. Yu、J.J. Yang、C.X. Zhu、W.S. Hwang、W.Y. Loh、A.Y. Du、J.D. Chen、Albert Chin、S. Biesemans、G.Q. Lo、D.-L. Kwong (1.SNDL, ECE Dept, National University of Singapore、2.Institute of Microelectronics, Singapore、3.IMEC、4.Dept. of Microelectronics, Fudan University、5.Dept. of Electronics Eng., Nat’l Chiao-Tung Univ.)

https://doi.org/10.7567/SSDM.2007.A-8-3