[A-8-4] Highly Manufacturable and Cost-effective Single TaxC / HfxZr(1-x)O2 Gate CMOS Bulk Platform for LP Applications at the 45nm Node and Beyond

M. Muller、C. Hobbs、A. Zauner、S. Barnola、T. Salvetat、S. Lhostis、S. Couderc、P. Perreau、D. H. Triyoso、M. Raymond、E. Luckowski、M. Rafik、A. Cathignol、G. Ribes、D. Fleury、K. Romanjek、S. Pokrant、S. Jullian、P. Morin、M. Aminpur、P. Gouraud、C. Laviron、S. Zoll、P. Garnier、F. Salvetti (1.NXP Semiconductors、2.Freescale、3.STMicroelectronics、4.NXP Semiconductors, Research、5.CEA-LETI、6.Freescale Semiconductor Inc.)

https://doi.org/10.7567/SSDM.2007.A-8-4