[A-9-2] Effectiveness of Aluminum Incorporation in Nickel Silicide and Nickel Germanide Metal Gates for Work Function Reduction

Andy E.-J. Lim、Rinus T.P. Lee、Alvin T.Y. Koh、Ganesh S. Samudra、Dim-Lee Kwong、Yee-Chia Yeo (1.Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapore)

https://doi.org/10.7567/SSDM.2007.A-9-2