[A-9-2] Effectiveness of Aluminum Incorporation in Nickel Silicide and Nickel Germanide Metal Gates for Work Function Reduction

Andy E.-J. Lim, Rinus T.P. Lee, Alvin T.Y. Koh, Ganesh S. Samudra, Dim-Lee Kwong, Yee-Chia Yeo (1.Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapore)

https://doi.org/10.7567/SSDM.2007.A-9-2