[B-1-5] Silicon Strain-Transfer-Layer (STL) and Graded Source/Drain Stressors for Enhancing the Performance of Silicon-Germanium Channel P-MOSFETs

Grace Huiqi Wang, Eng-Huat Toh, Keat-Mun Hoe, S. Tripathy, S. Balakumar, Guo-Qiang Lo, Ganesh Samudra, Yee-Chia Yeo (1.Silicon Nano Device Lab., Dept. of Electrical and Computer Engineering, National University of Singapore)

https://doi.org/10.7567/SSDM.2007.B-1-5