In-Depth Study of Two-Dimensional Layout Dependences in Multiple-Stressor CMOS for 45 nm Technology Node High-Performance Applications

T. Miyashita; J. Ogura; T. Owada; T. Sakuma; H. Nomura; H. Miyaoka; A. Hasegawa; S. Yamaguchi; S. Satoh

doi:https://doi.org/10.7567/SSDM.2007.B-3-3

2007 International Conference on Solid State Devices and Materials

Sep 18, 2007 - Sep 21, 2007
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[B-3-3] In-Depth Study of Two-Dimensional Layout Dependences in Multiple-Stressor CMOS for 45 nm Technology Node High-Performance Applications

T. Miyashita, J. Ogura, T. Owada, T. Sakuma, H. Nomura, H. Miyaoka, A. Hasegawa, S. Yamaguchi, S. Satoh (1.Fujitsu Laboratories Ltd., 2.Fujitsu Limited)

https://doi.org/10.7567/SSDM.2007.B-3-3

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