[B-3-3] In-Depth Study of Two-Dimensional Layout Dependences in Multiple-Stressor CMOS for 45 nm Technology Node High-Performance Applications

T. Miyashita、J. Ogura、T. Owada、T. Sakuma、H. Nomura、H. Miyaoka、A. Hasegawa、S. Yamaguchi、S. Satoh (1.Fujitsu Laboratories Ltd.、2.Fujitsu Limited)

https://doi.org/10.7567/SSDM.2007.B-3-3