[B-5-4] Mobility Degradation in (110)-Oriented Ultra-thin Body Double-Gate pMOSFETs with SOI Thickness of less than 5nm

Ken Shimizu、Toshiro Hiramoto (1.Inst. of Industrial Science and CINQIE, University of Tokyo)

https://doi.org/10.7567/SSDM.2007.B-5-4