[B-7-3] Principal Guideline of Stress Design for Ion Enhancement in Advanced MOSFET Structure with Dual Stress Liner Technique

M. Nishikawa, H. Nomura, T. Miyashita, M. Kojima, Y. Takao, K. Hashimoto (1.Fujitsu Limited, 2.Fujitsu Laboratories Limited)

https://doi.org/10.7567/SSDM.2007.B-7-3