[B-7-3] Principal Guideline of Stress Design for Ion Enhancement in Advanced MOSFET Structure with Dual Stress Liner Technique

M. Nishikawa、H. Nomura、T. Miyashita、M. Kojima、Y. Takao、K. Hashimoto (1.Fujitsu Limited、2.Fujitsu Laboratories Limited)

https://doi.org/10.7567/SSDM.2007.B-7-3