[B-8-5L] A Novel Embedded Extension SiGe (e2SiGe) Process for PFET Performance Enhancement for 45nm Technology and beyond

L. W. Teo、H. Utomo、S. S. Tan、S. Y. Ong、C.W. Lai、Z. Luo、S.D. Kim、R. Stierstorfer、S. Mishra、H. Zhuang、C.W. Yap、Y. Zhang、J.-P. Han、R. Lipton、J. Li、G. Chiulli、J.C. Kim、B.F. Phoong、M. Eller、X. Wu、Y.M. Lee、N. Rovedo、R. Wise、H. Shang、H. Ng、J. Sudijono (1.Chartered Semiconductor Manufacturing Ltd、2.IBM System and Technology Group、3.Infineon Technologies、4.Samsung Electronics Co. Ltd、5.Alliances at IBM Semiconductor Research and Development Center (SRDC))

https://doi.org/10.7567/SSDM.2007.B-8-5L