[B-9-3] Novel Extended-Pi Shaped Silicon-Germanium (eΠ-SiGe) Source/Drain Stressors for Strain and Performance Enhancement in P-Channel FinFETs

Kian-Ming Tan, Tsung-Yang Liow, Rinus T. P. Lee, Ming Zhu, Keat Mun Hoe, Chih-Hang Tung, N. Balasubramanian, Ganesh S. Samudra, Yee-Chia Yeo. (1.Silicon Nano Device Lab., Dept of Electrical and Computer Engineering, National University of Singapore, 2.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2007.B-9-3