[B-9-3] Novel Extended-Pi Shaped Silicon-Germanium (eΠ-SiGe) Source/Drain Stressors for Strain and Performance Enhancement in P-Channel FinFETs

Kian-Ming Tan、Tsung-Yang Liow、Rinus T. P. Lee、Ming Zhu、Keat Mun Hoe、Chih-Hang Tung、N. Balasubramanian、Ganesh S. Samudra、Yee-Chia Yeo. (1.Silicon Nano Device Lab., Dept of Electrical and Computer Engineering, National University of Singapore、2.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2007.B-9-3