[C-1-2] Electrical properties of carbon nanotubes grown at a low temperature by radical chemical vapor deposition for future LSI interconnects

Daisuke Yokoyama, Kentaro Ishimaru, Takayuki Iwasaki, Shintaro Sato, Takashi Hyakushima, Mizuhisa Nihei, Yuji Awano, Hiroshi Kawarada (1.Waseda Univ., School of Sci & Eng., 2.MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.))

https://doi.org/10.7567/SSDM.2007.C-1-2