[F-2-1] Characterization of Zinc Oxide Films Grown by a Newly Developed Plasma Enhanced MOCVD Employing Microwave Excited High Density Plasma

Hirokazu Asahara, Atsutoshi Inokuchi, Kohei Watanuki, Masaki Hirayama, Akinobu Teramoto, Tadahiro Ohmi (1.New Industry Creation Hatchery Center, Tohoku University, 2.ROHM CO., LTD., 3.TOKYO ELECTRON LTD., 4.UBE INDUSTRIES, LTD.)

https://doi.org/10.7567/SSDM.2007.F-2-1