Plasma Deposition of HfO2 and TiO2 onto Plasma-Nitrided Ge Surfaces

Sanghyun Lee; Gerald Lucovsky; Joseph P. Long; Jan. Luning

doi:https://doi.org/10.7567/SSDM.2007.F-5-2

2007 International Conference on Solid State Devices and Materials

2007年9月18日〜 2007年9月21日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[F-5-2] Plasma Deposition of HfO2 and TiO2 onto Plasma-Nitrided Ge Surfaces

Sanghyun Lee、Gerald Lucovsky、Joseph P. Long、Jan. Luning (1.Department of Physics, North Carolina State University、2.Stanford Synchrotron Radiation Laboratory (SSRL))

https://doi.org/10.7567/SSDM.2007.F-5-2

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